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Hummer 6.2 Sputter System - SEM Sample Preparation


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Hummer® 6.2 Sputter Coater For SEM Sample Preparation.
Shown with Optional: Carbon Evaporation Accessory (CEA) and Thickness Monitor.
Optional:
CE Marked and  220-V

  • Complete package ready for coating includes; etch cathode, mechanical pump and oil, system manual
  • Noble Metal Targets Available: Gold, Silver, Palladium, Gold/Palladium  and Platinum
  • Single cabinet design with all assemblies in the cabinetry.
  • Integral dual stage direct drive rotary vane 1.4 cfm vacuum pump.
  • Manually controlled operation in plate mode.
  • Manually controlled operation in etch mode.
  • Manually controlled operation in plasma mode.
  • Pulse mode of operation for 30% duty cycle.
  • 3000 volt, 30 milliamperes power supply.
  • End point by time, 1 to 14 minutes.
  • End point by quartz thickness monitor option, 1 to 999 nm.
  • Anode and dark space shield attract heat bearing electrons away from the sample.
  • Magnet deflects electrons into anode and dark space shield.
  • Target 75 mm x 50 mm annulus.
  • Safety Interlock Hardware for vacuum and high voltage.
  • Automatic vent at process termination.
  • Adjustable stage height of up to 35 mm total movement.
  • Stage diameter accommodates up to 12 SEM pin stubs.
  • Stage diameter accommodates up to 75 mm diameter substrates.
  • Grain size less than 2 nanometers.
  • Plus/minus 10% uniformity over 75 mm diameter substrates without rotation of the sample.
  • Chamber 115 mm diameter x 125 mm height.
  • Chamber is annealed, ends are ground, polished and re-annealed.
  • System is 559 mm x 508 mm x 356 mm. (w,d,h)
  • Digital display of vacuum
  • Analog display of current.
  • Heat rise at the sample can be limited to 2┬░ C.
  • OPTIONAL:
  • CE Marked
  • 220-Volt
  • Tilt / Rotate Stage
  • Carbon Evaporation Accessory (CEA)
  • Turbomolecular pumping
  • Digital Thickness Monitor, 1 to 999nm