Plasma technology based systems are used to clean and modify surfaces, etch materials and deposit thin films.
Anatech plasma cleaning, surface modification and etching systems are barrel, box and in-line configured for production throughput, Failure Analysis and Research and Development.
Anatech HUMMER® sputtering systems are configured for deposition of metal and thin film in Scanning Electron Microscopy, Failure Analysis, Research and Development, and low volume production. The first of over 5000 HUMMER sputtering systems was delivered in 1970 by an Anatech founder and is still in active operation today.
Toll Free: 800-390-4449